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Multi-Patterning Techniques: Enabling Dimensions Beyond Lithography Resolution Limits

Lam Research demonstrates its advanced techniques for multiple patterning to create minute features on semiconductors. At sub-20 nanometer nodes, self-aligned patterning is used for line pitch scaling, which requires an increased number of deposition and etch steps to achieve dimensions beyond the lithography resolution limit. The self-aligned quadruple patterning process can produce a pattern four times as dense as the original, ensuring high pattern fidelity and scalability. As lithography solutions progress, multiple patterning techniques are expected to continue growing, and Lam Research will play a critical role in enabling manufacturers to develop increasingly powerful devices. Explore career opportunities at Lam Research: https://bit.ly/48cqg0g Lam Research website: https://www.lamresearch.com/ LinkedIn:   / lam-research   Facebook:   / lamresearchcorporation   X:   / lamresearch   Instagram:   / lam.research